Defect inspection - e-beam/electron beam
BOTTLENECKKLA Corporation dominates e-beam inspection tools required for EUV nodes where optical tools cannot resolve sub-nanometre defects.
Scanning electron microscopes resolve sub-nanometre defects invisible to optical tools. Voltage-contrast mode detects electrical faults. Required for EUV node ramp where optical resolution hits limits.
What the evidence shows
ASML and KLA collectively hold over 40% of the global e-beam wafer defect inspection market.
intelmarketresearch.comKLA and ASML each command a substantial market share exceeding 20%.
marketreportanalytics.comRESCORED JUL 2026oligopolyscaling
Who controls it
KLA CorporationApplied Materials
Where it sits in the stack
Related nodes
Full scorecard, owner shares, supply edges and the full tracked roster are in the desk letter.
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