DUV immersion lithography (ArF 193 nm)

ASML holds roughly eight in ten immersion scanner slots, and Nikon is the only other supplier with a qualified ArF 193i tool.

ArF immersion scanners at 193 nm for 20-65 nm layers. Still patterns most layers at 5-7 nm via multipatterning; highest lithography unit volume. ASML, Nikon split market; ASML holds ~85% share.

ArF immersion (193i) scanners for 20-65 nm layer patterning; remains dominant by volume including all multipatterning layers at 5-7 nm nodes.

Who controls it