EUV lithography (13.5 nm wavelength)

ASML ships every EUV scanner, and the >600 precision mirrors inside have no alternative optics source for sub-7 nm patterning.

Scanners using 13.5 nm wavelength light from tin plasma to pattern sub-7 nm features. Requires >600 precision mirrors and vacuum beam path; no alternative exists for leading-edge logic. ASML sole supplier; Zeiss sole optics source; supply chain duopoly embedded per tool.

Extreme ultraviolet scanners for sub-7 nm patterning using 13.5 nm EUV light generated by tin plasma; requires >600 optical components and high-vacuum beam path.

What the evidence shows

ASML is the world’s only supplier capable of EUV HVM.

It took over 20 years to bring 13.5-nm EUV wavelength online.

spectrum.ieee.org

No successor for EUV is definitively planned; EUV expected to carry for rest of decade.

RESCORED JUL 2026near-monopolyscaling

Who controls it

ASML Holding NV

$11B market · 202420.1% CAGRsource

Where it sits in the stack

Takes in: EUV mask, EUV photoresist-coated wafer, tin droplets for EUV plasma source

Sends on: EUV-exposed wafer at <7 nm resolution

depends onMask blanks Wet chemicals and electronic-grade acids/bases Pellicles

feeds intoPure-play leading-edge logic foundries (sub-5 nm)Export control and trade-compliance advisory Customs, trade facilitation, and freight forwarding Testing, inspection, and certification (TIC) firms

Related nodes

High-NA EUV (0.55 NA)DUV immersion lithography (ArF 193 nm)DUV dry lithography (KrF, i-line, g-line)

Full scorecard, owner shares, supply edges and the full tracked roster are in the desk letter.

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