High-NA EUV (0.55 NA)

ASML ships every High-NA EUV tool starting 2025 to three customers, gating all nodes beyond two nanometers.

Next-generation EUV at 0.55 numerical aperture for sub-2 nm resolution. ASML EXE:5200 priced ~€350 million; first deliveries 2025-2026. Intel, Samsung, TSMC sole initial customers; TSMC runs 2 nm on standard 0.33-NA EUV, so High-NA gates the nodes beyond 2 nm rather than 2 nm itself.

Next-generation EUV with 0.55 numerical aperture for sub-2 nm patterning; ASML EXE:5200 series priced at approximately 350 million euros per tool.

What the evidence shows

ASML plans to deliver 10 High-NA EUV scanners, each costing around $380 million.

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TSMC is taking a cautious approach to adopting High-NA EUV equipment.

Samsung and Intel have invested heavily in High-NA EUV as competitive barriers rise.

RESCORED JUL 2026near-monopolyemerging

Who controls it

ASML

$2.4B market · 202422.3% CAGRsource

Where it sits in the stack

depends onMask blanks Wet chemicals and electronic-grade acids/bases

feeds intoPure-play leading-edge logic foundries (sub-5 nm)

Related nodes

EUV lithography (13.5 nm wavelength)DUV immersion lithography (ArF 193 nm)DUV dry lithography (KrF, i-line, g-line)

Full scorecard, owner shares, supply edges and the full tracked roster are in the desk letter.

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