Pellicles

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An EUV pellicle must survive scanner power without eating the light, a materials problem so hard that only two suppliers ship qualified membranes.

Protective membrane stretched across the mask surface to block particles from landing on the pattern during exposure. EUV pellicles must survive high-power 13.5 nm radiation with >90% transmission, a materials-science constraint that delayed EUV adoption. Mitsui and S&S Tech share supply; ASML is developing alternatives to ease the bottleneck.

Thin membrane mounted over mask to prevent particle contamination during wafer exposure; EUV pellicles require greater than 90% transmission at 13.5 nm and are technically challenging to manufacture.

Why the concentration exists

Pellicles are thin membrane films stretched across photomasks to prevent particles from landing on the circuit pattern during exposure. They act as a protective dust cover while allowing lithographic light to pass through to the wafer below. The membrane must maintain high optical transparency to avoid degrading the image projected onto the silicon. This protection is essential because even microscopic particles on a photomask can create repeated defects across every wafer exposed using that mask.[1][4][7]

What the evidence shows

Qualification cycles for new pellicle designs in high-volume semiconductor fabs extend 12-24 months.

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Elevated costs for advanced EUV pellicles create obstacles for smaller manufacturers and startups, limiting new entrants.

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RESCORED JUL 2026oligopolyscaling5 companies

Who supplies it

Several other companies have entered or are positioning to enter the EUV pellicle market. ASML, Canatu, FST, and TSMC are identified as key players in the pellicles for EUV reticles market alongside the established suppliers. Shin-Etsu Chemical offers pellicles for photomask protection across lithography generations. The list of companies involved in pellicle manufacturing includes JSR Corporation, DuPont, Fujifilm, and Entegris.[6][9][11][12]

TSMC has taken the unusual step of repurposing its old 8-inch Fab 3 in Hsinchu Science Park to produce EUV pellicles internally. This vertical integration move reflects the strategic importance of securing pellicle supply for advanced node manufacturing. The foundry's decision to manufacture its own pellicles signals concern about external supply adequacy. Samsung has also invested in pellicle handling infrastructure for its Taylor fab.[2][15]

Who controls it

EntegrisKLA CorporationS&S Tech+2 more tracked

$2.5B market · 20256.5% CAGRsource

What it depends on, and what depends on it

Pellicles are positioned between the lithography light source and the photomask in the semiconductor fabrication process. They attach to reticles that contain the circuit patterns projected onto silicon wafers. The pellicle must be compatible with the dual-pod configuration used for EUV reticle handling and storage. Designing a pellicle-compatible pod requires close collaboration between the pod manufacturer, pellicle supplier, and lithography tool manufacturer.[3]

Approximately 25% of global pellicle production serves the flat panel display sector rather than semiconductors. A single semiconductor fabrication facility utilizes between 5,000 and 10,000 photomasks simultaneously. Each of these photomasks requires periodic pellicle replacement every 12 to 18 months for DUV applications. Pellicle-related yield improvements can reduce wafer scrap rates by 2-3%, representing annual savings exceeding $50 million per high-volume fabrication facility.[8]

Where it sits in the stack

Takes in: Inspected photomask, pellicle membrane material (polysilicon/SiN)

Sends on: Pellicle-protected mask ready for scanner installation

depends onMask blanks Semiconductor capital equipment Semiconductor materials and consumables Specialty and industrial gases Mask inspection

feeds intoEUV lithography (13.5 nm wavelength)Merchant mask shops

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What would break it

Multiple new production facilities for carbon nanotube pellicles are under development. Mitsui Chemicals is building CNT pellicle production facilities at its Iwakuni-Ohtake Works with capacity of 5,000 sheets per year. Lintec Corp plans to begin mass production of CNT pellicles by the end of 2026 with annual capacity of 10,000 units. These capacity additions could ease the supply constraint for next-generation pellicles.[13][14]

Significant capital is flowing into CNT pellicle development as manufacturers seek alternatives to conventional materials. Major industry players have invested over $50 million in carbon nanotube pellicle research and development. Lintec Corp is investing approximately ¥7 billion ($44.0 million) in its CNT pellicle production capability. This investment wave reflects confidence that CNT technology will become the dominant approach for EUV pellicles.[10][13]

Canatu has granted a commercial production license for its CNT100 SEMI reactor technology to FST, expanding the potential supplier base. The company received Site Acceptance Test approval for its first reactor shipped to a semiconductor customer in September 2024. Canatu CNT pellicle membranes can increase productivity in EUV lithography processes by 8-15%. This licensing model could accelerate capacity expansion beyond the traditional supply chain.[5][16]

What to watch

Mitsui Chemicals has scheduled completion of its new CNT pellicle production facilities for December 2025. The company confirmed completion of a CNT EUV pellicle mass production line in December 2025, targeting supply in fiscal year 2026. This capacity will support next-generation High NA EUV lithography systems requiring higher power output.[5][14]

Samsung's Taylor fab in Texas will be the company's first facility to use pellicles for EUV lithography. The company has ordered dedicated pellicle attachment, detachment, and inspection systems from FST in a contract worth 25 billion won ($17.5 million). These tools support both conventional metal-silicide EUV pellicles and next-generation carbon nanotube pellicles.[2]

Lintec Corp targets ¥30 billion ($188.6 million) in revenue from pellicles and related products by the fiscal year ending March 2031. ASML ecosystem suppliers advanced EUV pellicle production scaling using CNT-based films for 3nm and below nodes as of May 2026. Canatu achieved commercial authorization for CNT pellicle production in October 2025 after successful reactor deployment.[5][13]

Sources

Full scorecard, owner shares, supply edges and the full tracked roster are in the desk letter.

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