Plasma etch - dielectric etch
BOTTLENECKLam Research dominates dielectric etch and the extreme aspect ratios required for 3D NAND stacking are technically prohibitive for challengers.
Plasma-etches insulating oxides and nitrides to form contacts, vias, and capacitor holes. High-aspect-ratio dielectric etch for 3D NAND string stacking is the most demanding application. Lam Research holds dominant share; etch depth requirements grow with layer count.
What the evidence shows
Dry Etching Equipment segment dominated the semiconductor dielectric etching market with a 58.39% revenue share in 2024.
snsinsider.comBy dielectric material, silicon dioxide led with 38.13% of dielectric etchers market share in 2025.
mordorintelligence.comRESCORED JUL 2026oligopolyscaling
Who controls it
Lam Research
Where it sits in the stack
Related nodes
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