chokepoints.ai
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10 layers580 nodes2,376 dependencies9 chokepoints112 bottlenecks6,500+ companiesnode size = companies identified

CHOKEPOINTS

The 9 chokepoints of the AI compute stack

580 nodes in the stack were scored on the same four-part test — concentrated, defended, non-routable, load-bearing (see how on the methodology page). Only 9 cleared all four. No top-ten cut, no curation: this is the entire surviving set, the same form the atlas uses to grade every other node.

Every node scored on concentration, moat, downstream reach and routability, then adversarially re-verified. Rescored 15 Jul 2026 · 990 dimensions challenged.

L1 · Semiconductor Manufacturing
DUV immersion lithography (ArF 193 nm)

ASML holds roughly eight in ten immersion scanner slots, and Nikon is the only other supplier with a qualified ArF 193i tool.

ASML
view in atlas
L1 · Semiconductor Manufacturing
EUV lithography (13.5 nm wavelength)

ASML ships every EUV scanner, and the >600 precision mirrors inside have no alternative optics source for sub-7 nm patterning.

ASML Holding NV
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L1 · Semiconductor Manufacturing
HBM stacking - TSV and mass reflow/thermocompression bonding

Three firms control HBM stacking through proprietary TSV and bonding, and CoWoS integration requirements lock out new entrants for years.

SK HynixSamsung ElectronicsMicron Technology+4 more tracked
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L2 · Compute Hardware
High-bandwidth memory (HBM)

SK hynix dominates HBM3E supply and CoWoS packaging scarcity constrains total output.

SK HynixSamsung ElectronicsMicron Technology+5 more tracked
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L0 · Raw Materials & Extraction
High-purity quartz (HPQ) mining and processing

Sibelco and one other firm mine a unique Spruce Pine vein that feeds nearly all semiconductor-grade crucibles, and no comparable deposit is in production.

Sibelco+62 more tracked
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L1 · Semiconductor Manufacturing
Lithography systems

ASML's grip on advanced lithography means the resolution ceiling and wafer throughput at leading nodes depend on systems from a single supplier.

ASMLNikonCanon+3 more tracked
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L1 · Semiconductor Manufacturing
Mask blanks

Hoya shares a duopoly on defect-prone coated mask substrates, where a single blank flaw replicates across every chip printed, deterring new entry.

HOYAAGCShin-Etsu Chemical+1 more tracked
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L1 · Semiconductor Manufacturing
Mask writing (e-beam writers)

IMS Nanofabrication alone ships production EUV multi-beam mask writers, and no second source matches the nanometer-precision throughput required.

JEOLNuFlare+2 more tracked
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L0 · Raw Materials & Extraction
Rare earth separation and refining

China controls nearly all global rare earth separation capacity and can restrict exports to dictate magnet costs worldwide.

Lynas Rare EarthsMP MaterialsChina Northern Rare Earth Group+3 more tracked
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How we classify See the 112 bottlenecks

Full scorecard, owner shares, supply edges and the full tracked roster are in the desk letter.

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